Product Leader | Semiconductor Applications | AI-Enabled Workflows

Paresh Mathur

Product leader with 8+ years of experience spanning semiconductor lithography, data-intensive optimization, and cross-functional product delivery.

I work in semiconductor software and product leadership, mostly in environments where the systems are technically deep, the data is heavy, and the tradeoffs are not obvious.

My job is usually some combination of making the problem clearer, aligning the right people, and helping the team ship something useful.

Portrait of Paresh Mathur

Current scope

Full resume

Current Scope

10+ products

Lithography application products across diagnostics, optimization, computational patterning, and diagnostics.

Portfolio

4 teams

Cross-team planning, staffing tradeoffs, and dependency management.

People

~35 specialists

Engineers and specialists within portfolio scope.

Product Launches

2 suites shipped

Defined and launched 2 product suites and continue to lead a third.

About

Over the past decade, I have worked across legacy Canon 8-inch lithography systems and advanced EUV environments, helping teams turn machine, process, and wafer data into production-grade applications, diagnostics, and KPIs.

A lot of what I enjoy is translation: taking mathematically complex or physically complicated systems and making them understandable enough for engineers, stakeholders, and customers to actually use.

Experience highlights

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Dec 2024 - Apr 2025, Jun 2025 - Present

Chief Product Owner

ASML

Lead a portfolio of 10+ lithography application products across diagnostics, on-scanner optimization, and computational patterning and diagnostics.

Nov 2022 - Present

Product Owner

ASML

Defined and launched 2 product suites and continue to lead a third, centered on model-based wafer-topography optimization.

Jul 2016 - Mar 2019

Engineer, Equipment Expert Team

TSMC

Led a big-data optimization initiative on an EUV source, engineering features from source data to optimize pre-pulse versus main-pulse timing.